St.-Petersburg, Russia

Mikhail Ivanovich Gouskov


Average Co-Inventor Count = 4.3

ph-index = 2

Forward Citations = 19(Granted Patents)


Location History:

  • St. Petersburg, RU (2001)
  • 194352 St. Petersburg, RU (2003 - 2004)

Company Filing History:


Years Active: 2001-2004

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3 patents (USPTO):Explore Patents

Title: The Innovative Path of Inventor Mikhail Ivanovich Gouskov

Introduction:

Mikhail Ivanovich Gouskov is a prominent inventor based in St. Petersburg, Russia, with a remarkable portfolio of 3 patents showcasing his groundbreaking work in the field of plasma outside chemical vapor deposition. His inventive spirit and dedication to technology have led to revolutionary advancements in the industry.

Latest Patents:

Gouskov's latest patents include the "Multiple torch—multiple target method and apparatus for plasma outside chemical vapor deposition" and the "Method of making an optical fiber preform via multiple plasma depositing and sintering steps." These patents demonstrate his expertise in developing cutting-edge techniques for glass deposition and optical fiber preform production.

Career Highlights:

Throughout his career, Gouskov has made significant contributions to the field of plasma technology. His innovative approach to plasma deposition processes has earned him recognition as a pioneer in the industry. By continuously pushing the boundaries of what is possible, he has established himself as a trailblazer in the world of inventions.

Collaborations:

Gouskov has collaborated with top professionals in the industry, including Dau Wu and Mohammad Afzal Aslami. His partnerships with talented individuals have allowed him to exchange ideas, share knowledge, and create solutions that have the potential to transform the way we think about technology.

Conclusion:

Inventor Mikhail Ivanovich Gouskov's relentless pursuit of innovation and his passion for discovery have propelled him to the forefront of the technological landscape. His patents stand as a testament to his brilliance, creativity, and unwavering commitment to pushing the boundaries of what is possible in the world of plasma deposition.

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