Mike Wen-Jeh Su

Title: Mike Wen-Jeh Su: Innovator in Semiconductor Technology

Introduction

Mike Wen-Jeh Su is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

One of Mike Wen-Jeh Su's key patents is titled "Method for forming oxide layer on conductor plug of trench structure." This invention outlines a method that includes several essential steps. First, a substrate is provided where a trench is located inside the substrate, and this trench is partly filled by a conductor plug. Second, a plasma enhanced tetraethyl-orthosilicate layer is formed on the substrate, which also fills the trench and covers the conductor plug. Finally, the plasma enhanced tetraethyl-orthosilicate layer is removed until the substrate is not covered, while the conductor plug remains covered by this layer. The advantages of applying the plasma enhanced tetraethyl-orthosilicate layer include a compacted structure and a high deposit rate. Mike holds 1 patent for this innovative method.

Career Highlights

Mike Wen-Jeh Su is currently associated with Mosel Vitelic Corporation, where he continues to contribute to advancements in semiconductor technology. His work has been instrumental in developing methods that improve manufacturing processes and product quality.

Collaborations

Throughout his career, Mike has collaborated with talented individuals such as Yi-Chuan Yang and Jason Chien-Song Chu. These collaborations have fostered an environment of innovation and creativity, leading to significant advancements in their field.

Conclusion

Mike Wen-Jeh Su is a prominent figure in the semiconductor industry, known for his innovative approaches and valuable contributions. His patent on the method for forming oxide layers demonstrates his commitment to enhancing technology in this critical field.