Company Filing History:
Years Active: 2020
Title: Mike VonDenHoff: Innovator in Wafer Metrology
Introduction
Mike VonDenHoff is a notable inventor based in Munich, Germany. He has made significant contributions to the field of wafer metrology, particularly in identifying nuisances and defects of interest in semiconductor manufacturing. His innovative approach has the potential to enhance the efficiency and accuracy of defect detection processes.
Latest Patents
Mike VonDenHoff holds 1 patent for his invention titled "Identifying nuisances and defects of interest in defects detected on a wafer." This patent outlines methods and systems for identifying nuisances and defects of interest (DOIs) in defects detected on a wafer. The method involves acquiring metrology data generated by a metrology tool that performs measurements at various points on the wafer. It also includes determining the locations of defects concerning the measurement points and assigning metrology data to these defects as attributes. This innovative approach allows for the classification of defects as nuisances or DOIs based on the assigned attributes.
Career Highlights
Mike VonDenHoff is currently employed at KLA-Tencor Corporation, a leading company in the semiconductor industry. His work focuses on improving the processes involved in wafer inspection and defect analysis. His expertise in metrology has positioned him as a valuable asset to his team and the company.
Collaborations
Some of Mike's coworkers include Martin Plihal and Brian Duffy. Their collaborative efforts contribute to the advancement of technologies in the semiconductor field.
Conclusion
Mike VonDenHoff's innovative work in wafer metrology exemplifies the importance of advancements in semiconductor manufacturing. His contributions are paving the way for more efficient defect detection and analysis processes.