Pittsburgh, PA, United States of America

Mike Matuszewski



Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Mike Matuszewski: Innovator in Fluid Treatment Technology

Introduction

Mike Matuszewski is a notable inventor based in Pittsburgh, PA (US). He has made significant contributions to the field of fluid treatment technology. His innovative approach has led to the development of a unique fluid treatment device that utilizes advanced UV lamp technology.

Latest Patents

Matuszewski holds 1 patent for his invention titled "Fluid Treatment Device." This inventive system comprises a housing designed to receive a flow of fluid. For the first time, it employs a modular assembly of UV lamps. The modular assembly includes at least two UV sources that are substantially parallel to each other and transverse to the fluid flow. In one embodiment, one of the UV sources is positioned in a plane below all other lamps and is designed to operate at a higher power than the others. This innovative arrangement is complemented by a baffle system that directs the fluid flow into the treatment area.

Career Highlights

Mike Matuszewski is currently employed at Calgon Carbon Corporation, where he continues to work on innovative solutions in fluid treatment. His expertise and dedication to advancing technology in this field have made him a valuable asset to his company.

Collaborations

Throughout his career, Matuszewski has collaborated with notable colleagues, including Keith G. Bircher and Walter George Tramposch. These collaborations have further enhanced his work and contributed to the development of effective fluid treatment solutions.

Conclusion

Mike Matuszewski's contributions to fluid treatment technology exemplify the spirit of innovation. His patent for the fluid treatment device showcases his commitment to improving environmental and industrial processes. His work continues to influence the field and inspire future advancements.

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