Raisio, Finland

Mika Niittyinperä

This inventor holds 1 USPTO granted patent and 2 EPO patents. Top assignee: Nokia Technologies Oy. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mika Niittyinperä. Retrieved from https://idiyas.com/inventor/mika-niittyinpera

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Mika Niittyinperä: Innovator in Electronic Device Covering Technology

Introduction

Mika Niittyinperä is a notable inventor based in Raisio, Finland. She has made significant contributions to the field of electronic device technology, particularly through her innovative patent.

Latest Patents

Mika holds a patent for an "Apparatus and method for providing an apparatus comprising a covering portion for an electronic device." This invention includes a covering portion designed to cover at least part of an electronic device, along with a microphone that is electrically connected to the covering portion. The design ensures that at least one electrical connection for the microphone is provided on the covering portion, enhancing the functionality of electronic devices.

Career Highlights

Mika Niittyinperä is currently employed at Nokia Technologies Oy, where she continues to develop and refine her innovative ideas. Her work at Nokia has positioned her as a key player in the advancement of technology related to electronic devices.

Collaborations

Mika collaborates with talented individuals such as Lasse Pykäri and Benedict Slotte, contributing to a dynamic and innovative work environment.

Conclusion

Mika Niittyinperä's contributions to electronic device technology through her patent and work at Nokia Technologies Oy highlight her role as a significant inventor in the field. Her innovative approach continues to influence the development of new technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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