Maebashi, Japan

Mika Kanzawa

This inventor holds 1 USPTO granted patent. Top assignee: Jins Holdings Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mika Kanzawa. Retrieved from https://idiyas.com/inventor/mika-kanzawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: The Innovative Journey of Mika Kanzawa

Introduction

Mika Kanzawa is a notable inventor based in Maebashi, Japan. He has made significant contributions to the field of optics, particularly with his innovative designs for eyeglass lenses. His work reflects a commitment to enhancing vision and improving the quality of life for individuals who rely on corrective eyewear.

Latest Patents

Mika holds a patent for a lens designed specifically for eyeglasses. This invention showcases his ability to blend functionality with comfort, addressing common issues faced by eyeglass wearers. His patent portfolio includes 1 patent, highlighting his focused approach to innovation in this niche.

Career Highlights

Mika is currently employed at Jins Holdings Inc., a company renowned for its dedication to eyewear innovation. His role at Jins allows him to collaborate with other talented professionals in the industry, furthering his impact on optical technology.

Collaborations

Mika has worked alongside talented colleagues, including Hasumi Natsume and Yukari Kitagawara. Their combined expertise fosters a creative environment that encourages the development of cutting-edge eyewear solutions.

Conclusion

Mika Kanzawa's contributions to the field of eyewear innovation exemplify the importance of creativity and collaboration in technology. His work continues to inspire advancements in optical design, making a lasting impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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