Seinäjoki, Finland

Miika Hautamäki

This inventor holds 2 USPTO granted patents. Top assignee: Epec Oy. Active years: 2024-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Miika Hautamäki. Retrieved from https://idiyas.com/inventor/miika-hautamäki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.3

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2024-2026

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2 patents (USPTO):Explore Patents

Title: Miika Hautamäki: Innovator in Display Technology

Introduction

Miika Hautamäki is a notable inventor based in Seinäjoki, Finland. He has made significant contributions to the field of display technology. His innovative work has led to the development of a unique patent that showcases his expertise and creativity.

Latest Patents

Miika Hautamäki holds a patent for a display assembly. This invention reflects his commitment to advancing technology in the display sector. The patent demonstrates his ability to create solutions that meet modern demands.

Career Highlights

Miika is currently employed at Epec Oy, a company known for its focus on advanced technology solutions. His role at Epec Oy allows him to apply his inventive skills in a practical setting. His contributions to the company have been instrumental in driving innovation.

Collaborations

Miika Hautamäki collaborates with his coworker, Ilkka Husgafvel. Together, they work on projects that push the boundaries of display technology. Their partnership exemplifies the importance of teamwork in the innovation process.

Conclusion

Miika Hautamäki is a dedicated inventor whose work in display technology has made a significant impact. His patent and contributions at Epec Oy highlight his role in advancing the field. His collaboration with Ilkka Husgafvel further emphasizes the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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