Gyeonggi-do, South Korea

Mihyung Chin

This inventor holds 1 USPTO granted patent and 1 published patent application and 2 EPO patents. Top assignee: Lg Display Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mihyung Chin. Retrieved from https://idiyas.com/inventor/mihyung-chin-u8exl2fn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Mihyung Chin: Innovator in Display Technology

Introduction

Mihyung Chin is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of display technology, particularly with his innovative patent related to display apparatuses.

Latest Patents

Mihyung Chin holds 1 patent for a display apparatus comprising a vibration device. This invention includes a display panel, a touch unit on the display panel, and a cover substrate that features both a light transmitting area and a light shielding area. The design incorporates a light shielding layer, a vibrating element, and an adhesive layer, enhancing the functionality of the display apparatus.

Career Highlights

Throughout his career, Mihyung Chin has worked with prominent companies in the technology sector, including LG Display, Ltd. and LG Display Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas in display technology.

Collaborations

Mihyung Chin has collaborated with talented individuals such as Nam Ki and Sejin Lee, contributing to the advancement of display technology through teamwork and shared expertise.

Conclusion

Mihyung Chin's contributions to display technology through his patent and professional collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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