Location History:
- Yokohama, JP (2016)
- Tokyo, JP (2019)
Company Filing History:
1 out of 1,357 
1 out of 2,348 Years Active: 2016-2019
Title: Miho Chujo: Innovator in Semiconductor Lithography
Introduction
Miho Chujo is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of semiconductor lithography, showcasing her expertise through her innovative patents. With a total of 2 patents, her work has had a notable impact on the industry.
Latest Patents
Miho Chujo's latest patents include a copolymer for semiconductor lithography and a resist composition. The first patent describes a copolymer for lithography that has specific turbidity characteristics, which are crucial for the performance of lithographic processes. The turbidity Th(80) is defined to be between 1.0 NTU and 4.6 NTU, while the turbidity Tm(80) ranges from 1.0 NTU to 3.8 NTU. These parameters are essential for ensuring the quality and effectiveness of the lithography process. The second patent focuses on a copolymer that contains both an acid leaving group and a non-acid leaving group, with specific ratios that optimize its performance in lithographic applications.
Career Highlights
Throughout her career, Miho Chujo has worked with notable companies such as Mitsubishi Rayon Company, Limited and Mitsubishi Chemical Corporation. Her experience in these organizations has allowed her to develop her skills and contribute to advancements in semiconductor technology.
Collaborations
Miho has collaborated with esteemed colleagues, including Atsushi Yasuda and Tomoya Oshikiri. These partnerships have further enriched her work and fostered innovation in her field.
Conclusion
Miho Chujo is a distinguished inventor whose contributions to semiconductor lithography are noteworthy. Her innovative patents and collaborations reflect her commitment to advancing technology in this critical area.