Miha Filipic

Title: Miha Filipic: Innovator in Semiconductor Technology

Introduction

Miha Filipic is a notable inventor based in Heverlee, Belgium. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods of patterning amorphous semiconductor layers.

Latest Patents

Miha Filipic holds 1 patent for a method of patterning an amorphous semiconductor layer. This patent discloses methods of patterning an amorphous semiconductor layer according to a predetermined pattern via laser ablation with a pulsed laser having a specific wavelength. The method includes providing the amorphous semiconductor layer on a substrate, applying a distributed Bragg reflector that is reflective at the laser wavelength, and using an absorbing layer that is absorptive at the same wavelength. The process involves patterning the absorbing layer by laser ablation, followed by etching the distributed Bragg reflector and the amorphous semiconductor layer using the patterned layers as masks. This innovative approach also includes methods for fabricating silicon heterojunction back contact photovoltaic cells using the described patterning process.

Career Highlights

Throughout his career, Miha Filipic has worked with prominent organizations such as Imec Vzw and Katholieke Universiteit Leuven. His work in these institutions has allowed him to advance his research and contribute to the development of cutting-edge technologies in the semiconductor field.

Collaborations

Miha has collaborated with notable colleagues, including Menglei Xu and Twan Bearda. These collaborations have further enriched his research and innovation efforts.

Conclusion

Miha Filipic's contributions to semiconductor technology through his innovative patent and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in semiconductor applications and photovoltaic technologies.