Santa Cruz, CA, United States of America

Miguel Angel Saldana

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 4.2

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2020-2022

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2 patents (USPTO):Explore Patents

Title: Innovations of Miguel Angel Saldana

Introduction

Miguel Angel Saldana is an accomplished inventor based in Santa Cruz, California. He holds two patents that contribute significantly to the field of semiconductor processing. His work focuses on advanced methods for thin film deposition and surface preparation.

Latest Patents

One of his latest patents is titled "Liquid precursor injection for thin film deposition." This technology involves a method of injecting a liquid precursor into a thin film deposition chamber. The process includes atomizing the liquid precursor into droplets and vaporizing them for deposition. The patent emphasizes the importance of maintaining stability in the mass flow rate of the liquid precursor during the process.

Another notable patent is "Method and apparatus for surface preparation prior to epitaxial deposition." This invention utilizes hydrogen plasma to remove contaminants from the surface of a wafer. The hydrogen plasma is injected through an elongated nozzle, ensuring effective removal of volatile compounds. The design includes protective liners and exhaust restrictors to minimize contamination during the process.

Career Highlights

Throughout his career, Miguel has worked with notable companies such as Aixtron SE and Eugenus, Inc. His experience in these organizations has allowed him to refine his expertise in semiconductor technologies and contribute to innovative solutions in the industry.

Collaborations

Miguel has collaborated with professionals like Niloy Mukherjee and Stephen E. Savas. These partnerships have fostered a creative environment for developing cutting-edge technologies in semiconductor processing.

Conclusion

Miguel Angel Saldana's contributions to the field of semiconductor processing through his patents demonstrate his innovative spirit and technical expertise. His work continues to influence advancements in thin film deposition and surface preparation techniques.

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