Location History:
- Tsukuba, JP (1998)
- Ibaraki, JP (1994 - 2008)
Company Filing History:
Years Active: 1994-2008
Title: Michitaka Morikawa: Innovator in Resist Composition Technology
Introduction
Michitaka Morikawa is a prominent inventor based in Ibaraki, Japan. He has made significant contributions to the field of resist composition technology, particularly in the development of alkali-soluble siloxane polymers. With a total of 5 patents to his name, Morikawa's work has had a substantial impact on electronic device manufacturing.
Latest Patents
Morikawa's latest patents include innovations such as an alkali-soluble siloxane polymer and a positive type resist composition. This resist composition features a photosensitive compound and a 1 µm thick resist film that exhibits 5% to 60% transmittance to i-line radiation. The composition is particularly useful in resist films undergoing oxygen plasma etching, showcasing its practical applications in the industry.
Career Highlights
Throughout his career, Michitaka Morikawa has worked with notable companies, including Sumitomo Chemical Company, Limited and Fujitsu Corporation. His experience in these organizations has allowed him to refine his expertise in resist technology and contribute to various innovative projects.
Collaborations
Morikawa has collaborated with esteemed colleagues such as Koji Higashi and Tadashi Shindo. These partnerships have fostered a collaborative environment that has led to advancements in their respective fields.
Conclusion
In summary, Michitaka Morikawa is a distinguished inventor whose work in resist composition technology has paved the way for advancements in electronic device manufacturing. His contributions continue to influence the industry and inspire future innovations.