The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2008
Filed:
May. 09, 2005
Keiji Watanabe, Kawasaki, JP;
Miwa Kozawa, Kawasaki, JP;
Shoichi Suda, Kawasaki, JP;
Fumi Yamaguchi, Ibaraki, JP;
Isao Yahagi, Ibaraki, JP;
Michitaka Morikawa, Ibaraki, JP;
Keiji Watanabe, Kawasaki, JP;
Miwa Kozawa, Kawasaki, JP;
Shoichi Suda, Kawasaki, JP;
Fumi Yamaguchi, Ibaraki, JP;
Isao Yahagi, Ibaraki, JP;
Michitaka Morikawa, Ibaraki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 μm thick resist film formed of the positive type resist composition which has 5% to 60% of transmittance to i-line radiation; Preferably, 0.25≦a≦0.60, and 0≦c≦0.25. The composition is preferably used in a resist film undergoing oxygen plasma etching.