Michirou Takano

Title: Michirou Takano: Innovator in Photoresist Baking Technology

Introduction

Michirou Takano is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of photoresist technology, particularly in the methods and apparatus for baking photoresist applied on substrates. With a total of 3 patents to his name, Takano's work has advanced the efficiency and effectiveness of photomask substrate processing.

Latest Patents

Takano's latest patents include a method for baking photoresist applied on a substrate and an apparatus for the same purpose. The method involves positioning a photomask substrate, which is rectangular and coated with photoresist, above a lower heating plate while maintaining a proximity distance. The lower heating plate features a heat unifying ring that surrounds the photomask substrate, with a taper section designed at a predetermined angle. An upper heating plate is placed above the lower heating plate, creating a baking chamber that shields the process from external influences. This innovative design enhances the baking process, ensuring uniform heating and improved results.

Career Highlights

Takano is currently employed at Kabushiki Kaisha Toshiba, where he continues to develop and refine his inventions. His work has been instrumental in advancing the technology used in the semiconductor industry, particularly in the production of photomasks.

Collaborations

Some of Takano's coworkers include Katsuhisa Mita and Yasuo Matsuoka, who have collaborated with him on various projects within the company.

Conclusion

Michirou Takano's contributions to photoresist technology exemplify the innovative spirit of modern inventors. His patents reflect a commitment to enhancing manufacturing processes in the semiconductor industry.