Izumi-ku, Sendai-shi, Miyagi-ken, 981-3222, Japan

Michio Niwano


Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:

goldMedal2 out of 832,680 
Other
 patents

Years Active: 2002-2003

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Michio Niwano

Introduction

Michio Niwano is a notable inventor based in Izumi-ku, Sendai-shi, Miyagi-ken, Japan. With a total of two patents to his name, he has made significant strides in the field of semiconductor technology through his innovative approaches to substrate treatment and monitoring.

Latest Patents

His latest patents are focused on methods and apparatuses for substrate treatment and surface state monitoring. The first patent, titled "Substrate Treating Method and Apparatus," describes a system that enables in-situ monitoring of the surface state of semiconductor substrates. This apparatus includes various components such as substrate treating means, infrared radiation sources, and advanced detection and analysis capabilities that allow real-time monitoring of the substrate’s surface condition.

The second patent, known as "Surface State Monitoring Method and Apparatus," also emphasizes in-situ monitoring but focuses specifically on measuring contaminants on semiconductor substrates. This method employs condensing means to direct infrared radiation onto the substrate and involves detection and analysis mechanisms that evaluate the cleanliness and quality of the surface being monitored.

Career Highlights

Throughout his career, Michio Niwano has demonstrated a commitment to innovation in semiconductor processing technology. His expertise and inventions have contributed greatly to advancements in this critical industry, which plays a significant role in modern technology.

Collaborations

Niwano has collaborated with notable colleagues such as Haruo Yoshida and Michiaki Endo. Together, they have worked on projects that aim to improve techniques and equipment used in semiconductor fabrication, further pushing the boundaries of what is possible in the industry.

Conclusion

Michio Niwano’s work exemplifies the spirit of innovation in the realm of semiconductor technology. With his patents focusing on substrate treatment and surface monitoring, he continues to impact the advancement of technology significantly. His collaborative efforts with fellow inventors highlight the importance of teamwork in driving innovations that shape the future.

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