Michiharu Tamura

Title: Michiharu Tamura: Innovator in Silicon Crystal Production

Introduction

Michiharu Tamura is a notable inventor from Kumage-gun, Japan, recognized for his contributions to the field of materials science. His innovative work primarily focuses on the production of dislocation-free silicon single crystals, which are essential for various technological applications.

Latest Patents

Tamura holds a patent for a "Method for production of dislocation-free silicon single crystal." This invention is directed to a method for the production of a dislocation-free silicon single crystal by the Czochralski method. The method attains growth of the main body part of the dislocation-free silicon single crystal by immersing a seed crystal in a melt of silicon and then pulling the seed crystal without recourse to the necking. The seed crystal used is a dislocation-free silicon single crystal. The horizontal maximum length of the part of the seed crystal being immersed in the melt at the time of completing the immersion of the seed crystal in the melt is not less than 5 mm. The immersing rate of the seed crystal in the melt is not more than 2.8 mm/min, and the part of the seed crystal to be immersed in the melt is a crystal as grown. This patent highlights Tamura's significant contribution to improving silicon crystal production techniques.

Career Highlights

Throughout his career, Michiharu Tamura has worked with prominent companies in the industry. He has been associated with Nippon Steel Corporation and NSC Electron Corporation, where he has applied his expertise in materials science and engineering. His work has had a lasting impact on the development of advanced materials.

Collaborations

Tamura has collaborated with esteemed colleagues, including Toshio Iwasaki and Shin-ichi Fujimoto. These collaborations have further enriched his research and innovations in the field of silicon crystal production.

Conclusion

Michiharu Tamura's innovative methods for producing dislocation-free silicon single crystals have made significant contributions to materials science. His patents and collaborations reflect his dedication to advancing technology in this critical area.