Paris, France

Michel Marchal

This inventor holds 1 USPTO granted patent. Top assignee: Thomson-Csf. Active years: 1981.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Michel Marchal. Retrieved from https://idiyas.com/inventor/michel-marchal

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1981

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Michel Marchal

Introduction: Michel Marchal is an accomplished inventor based in Paris, France, known for his significant contributions to the field of embossing technology. With a unique patent to his name, he has made strides in improving how embossed patterns are applied to information-bearing substrates.

Latest Patents: Marchal holds a patent for a "Method of making an embossed pattern on an information bearing substrate." This invention presents an improved process that utilizes a writing concentrated beam to create openings in a film that can undergo residue-free evaporation. The subsequent overlay of a photoresist layer enables the production of the intended embossed pattern once it is exposed and processed.

Career Highlights: Throughout his career, Michel Marchal has been affiliated with Thomson-CSF, where he has further developed his expertise in innovative technologies. His work there has contributed to advancements in various applications, making a mark in the industry for quality and efficiency.

Collaborations: Marchal has collaborated with notable coworkers, including Jean E Picquendar and Jean Claude Dubois. Their teamwork and shared expertise have undoubtedly enriched the research and development environment at Thomson-CSF, leading to enhanced innovations.

Conclusion: Michel Marchal's contributions to embossing technology, particularly through his patented method, underscore the importance of innovation in modern applications. With a dedicated career and valuable collaborations, he continues to influence the landscape of technology and invention.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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