Somers, NY, United States of America

Michael Stuart Gordon

USPTO Granted Patents = 4 

Average Co-Inventor Count = 3.2

ph-index = 3

Forward Citations = 20(Granted Patents)


Location History:

  • Mt. Kisco, NY (US) (1997)
  • Somers, NY (US) (1998)

Company Filing History:


Years Active: 1997-1998

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4 patents (USPTO):Explore Patents

Title: Innovations by Michael Stuart Gordon

Introduction

Michael Stuart Gordon is a notable inventor based in Somers, NY (US). He has made significant contributions to the field of electron beam lithography, holding a total of 4 patents. His work focuses on improving the efficiency and accuracy of charged particle systems.

Latest Patents

One of his latest patents is a "Method for monitoring resist charging in a charged particle system." This method involves a reference plate registration scheme that utilizes a resist-coated reference plate with registration marks. The scanning process includes depositing charge on the surface and calculating the difference between scans to monitor resist charging. Another significant patent is the "Method for centering a lens in a charged-particle system." This technique enhances the alignment of an electron beam through the optical axis of lenses, using deflectors to pivot the beam and measure resolution without relying on an observation station.

Career Highlights

Michael Stuart Gordon is currently employed at International Business Machines Corporation (IBM). His work at IBM has allowed him to develop innovative methods that advance the capabilities of lithographic systems. His contributions have been instrumental in enhancing the precision of electron beam technologies.

Collaborations

Throughout his career, Michael has collaborated with esteemed colleagues such as Paul F. Petric and Donald F. Haire. These collaborations have fostered an environment of innovation and have led to the development of groundbreaking technologies in the field.

Conclusion

Michael Stuart Gordon's contributions to electron beam lithography and charged particle systems exemplify the spirit of innovation. His patents reflect a commitment to advancing technology and improving the efficiency of lithographic processes.

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