Fort Collins, CO, United States of America

Michael R Stabnow

This inventor holds 4 USPTO granted patents and 1 published patent application and 2 EPO patents. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2010-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Michael R Stabnow. Retrieved from https://idiyas.com/inventor/michael-r-stabnow

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.6

ph-index = 3

Forward Citations = 32(Granted Patents)


Location History:

  • Ft. Collins, CO (US) (2010)
  • Fort Collins, CO (US) (2011 - 2014)

Company Filing History:


Years Active: 2010-2014

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4 patents (USPTO):Explore Patents

Title: Michael R. Stabnow: Innovator at Hewlett Packard Enterprise

Introduction

Michael R. Stabnow is an accomplished inventor based in Ft. Collins, Colorado. He is currently associated with Hewlett Packard Enterprise Development LP, where he contributes to various innovative projects. Despite having no patents to his name, his work in the technology sector is noteworthy.

Latest Patents

As of now, Michael R. Stabnow holds 4 patents. This may reflect his role in collaborative projects rather than individual patent filings.

Career Highlights

Throughout his career, Michael has been involved in significant technological advancements at Hewlett Packard Enterprise. His expertise and dedication have made him a valuable asset to the company.

Collaborations

Michael has worked alongside talented colleagues such as Wade J. Satterfield and Tyler Easterling. Their combined efforts contribute to the innovative environment at Hewlett Packard Enterprise.

Conclusion

Michael R. Stabnow is a dedicated inventor whose contributions to Hewlett Packard Enterprise highlight his commitment to innovation in technology. His collaborative spirit and professional background make him a noteworthy figure in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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