Company Filing History:
Years Active: 1986
Title: The Innovations of Michael R Melloch
Introduction
Michael R Melloch is a notable inventor based in West Lafayette, IN (US). He has made significant contributions to the field of photochemical patterning. His work has led to advancements in the formation of plasma etch masks, which are crucial in various manufacturing processes.
Latest Patents
Melloch holds a patent for a method involving the formation of a plasma etch mask on a film on a substrate. This process utilizes photodecomposition of a gas at selective portions of the film's surface to deposit etch mask material. The patent details the photodecomposition achieved through blanket illumination via a photomask and direct writing with a computer-controlled laser. Notably, the formation of the etch mask can be immediately followed by plasma etching without breaking vacuum, showcasing the efficiency of his method.
Career Highlights
Michael R Melloch is associated with Texas Instruments Corporation, where he has been able to apply his innovative ideas in a practical setting. His work at Texas Instruments has allowed him to contribute to cutting-edge technologies in the electronics industry.
Collaborations
Melloch has collaborated with Edward C Jelks, further enhancing the innovative environment at Texas Instruments Corporation. Their combined expertise has likely led to advancements in their respective fields.
Conclusion
Michael R Melloch's contributions to photochemical patterning and plasma etch mask formation highlight his role as an influential inventor in the technology sector. His work continues to impact the industry positively.