The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 1986
Filed:
Apr. 10, 1985
Applicant:
Inventors:
Edward C Jelks, Dallas, TX (US);
Michael R Melloch, West Layfayette, IN (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C23F / ; B29C / ;
U.S. Cl.
CPC ...
156643 ; 118728 ; 156646 ; 156656 ; 156657 ; 1566591 ; 156662 ; 156668 ; 156345 ; 204298 ; 20419235 ; 427 38 ; 427 531 ; 427 70 ;
Abstract
Formation of a plasma etch mask on a film on a substrate by photodecomposition of a gas at selective portions of the film's surface to deposit etch mask material and form the etch mask is disclosed. The photodecomposition by blanket illumination through a photomask and by direct write with a computer controlled laser are both disclosed. The formation of the etch mask can be immediately followed by the plasma etch without breaking vacuum.