This inventor holds 1 USPTO granted patent. Top assignee: Advanced Semiconductor Materials America, Inc.. Active years: 1992.
Company Filing History:
Years Active: 1992
Title: Michael R. Bonsaver: Innovator in Plasma Technology
Introduction
Michael R. Bonsaver is a notable inventor based in Phoenix, AZ, recognized for his contributions to the field of plasma technology. He has developed innovative solutions that enhance the efficiency of power transfer in chemical vapor deposition systems. His work is particularly significant in the semiconductor industry, where precision and efficiency are paramount.
Latest Patents
Bonsaver holds a patent for a "Transmission line for providing power to an electrode boat in a plasma." This invention involves a transmission line constructed from ceramic and nickel materials, designed to match the characteristic impedance of a boat assembly in a chemical vapor deposition system. The transmission line is strategically placed between a set of feedthroughs through the wall of a reactant tube and a set of contacts on the boat assembly. This design improves the efficiency of power transfer from an RF power source external to the reactant tube, particularly at high frequencies such as 13.56 MHz. The innovation enhances the repeatability of film deposition on wafers in the boat assembly, making it a valuable advancement in the field.
Career Highlights
Bonsaver is associated with Advanced Semiconductor Materials America, Inc., where he applies his expertise in semiconductor materials and plasma technology. His work has contributed to advancements in the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Throughout his career, Bonsaver has collaborated with notable colleagues, including David P. Lambert and Rand A. Conner. These collaborations have fostered innovation and development in the field of semiconductor technology.
Conclusion
Michael R. Bonsaver's contributions to plasma technology and semiconductor manufacturing are significant. His innovative patent demonstrates his commitment to improving efficiency in chemical vapor deposition systems. His work continues to influence the industry positively.