Berkshire, United Kingdom

Michael O'Donnell

This inventor holds 1 USPTO granted patent. Top assignee: Sulzer Mixpac Ag. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Michael O'Donnell. Retrieved from https://idiyas.com/inventor/michael-o-donnell-525yjmut

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Michael O'Donnell: Innovator in Discharge Device Technology

Introduction

Michael O'Donnell is a notable inventor based in Berkshire, GB. He has made significant contributions to the field of technology with his innovative ideas. O'Donnell holds one patent for a discharge device, showcasing his expertise and creativity in engineering.

Latest Patents

His most recent patent is for a discharge device, which reflects his commitment to advancing technology. This invention is designed to improve efficiency and functionality in its application, demonstrating O'Donnell's focus on practical solutions.

Career Highlights

Michael O'Donnell is currently employed at Sulzer Mixpac AG, a company known for its innovative solutions in the mixing and dispensing of materials. His role at the company allows him to apply his inventive skills in a collaborative environment, contributing to the development of cutting-edge technologies.

Collaborations

Throughout his career, O'Donnell has worked alongside talented individuals such as Martin Groentved and Jørgen Elmelund. These collaborations have likely enriched his experience and fostered a creative atmosphere for innovation.

Conclusion

Michael O'Donnell is a dedicated inventor whose work on discharge devices exemplifies his innovative spirit. His contributions to Sulzer Mixpac AG and collaborations with other professionals highlight his commitment to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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