Location History:
- Hopewell Junction, NY (US) (2009)
- Albany, NY (US) (2009 - 2011)
- Slingerlands, NY (US) (2020)
Company Filing History:
5 out of 164,108 
1 out of 962 
1 out of 244 
Years Active: 2009-2020
Title: The Innovative Contributions of Michael M Crouse
Introduction: Michael M Crouse, an accomplished inventor based in Albany, NY, has contributed significantly to the field of lithography with a total of five patents to his name. His innovative work focuses on enhancing the accuracy and efficiency of mask fabrication processes, which are crucial in semiconductor manufacturing.
Latest Patents: Among Michael's notable patents are two groundbreaking inventions. The first is the "Mask process aware calibration using mask pattern fidelity inspections." This patent outlines techniques for modifying a mask fabrication process based on identifying abnormalities in a fabricated lithography mask's pattern. By comparing the fabricated mask to its design, Michael's method ensures that any discrepancies are accounted for, leading to improved calibration models and adjustments to the fabrication process.
The second patented innovation is titled "MEEF reduction by elongation of square shapes." This method strategically relaxes optical proximity correction (OPC) algorithm constraints to allow for the elongation of post-OPC mask shapes. By focusing on one direction, the process effectively reduces the 1-dimensional MEEF, helping to produce patterns on wafers that are nearly circular within acceptable tolerances. These patents exemplify Michael's forward-thinking approach to lithographic technology.
Career Highlights: Throughout his career, Michael has worked for prominent companies, including IBM and Chartered Semiconductor Manufacturing Ltd. His time in these influential organizations has allowed him to refine his skills and contribute to significant advancements in lithography.
Collaborations: Michael M Crouse has also collaborated with notable professionals in the field, including Derren Neylon Dunn and Yasri Yudhistira. Their collaborative efforts have further solidified advancements in the technologies surrounding mask fabrication and semiconductor manufacturing.
Conclusion: Michael M Crouse's innovative contributions to lithography and semiconductor processes have made a lasting impact in the industry. With his five patents, he continues to push the boundaries of technology, ensuring more accurate and efficient manufacturing practices for the future. His work exemplifies how innovation can lead to significant improvements in complex technological fields.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.