This inventor holds 3 USPTO granted patents. Top assignee: Materials Research Corporation. Active years: 1983-1985.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1983-1985
Title: Innovations of Michael L Hill in Sputtering Technology
Introduction
Michael L Hill is an accomplished inventor based in New York, NY (US), known for his significant contributions to the field of sputtering technology. He holds a total of 3 patents, showcasing his innovative approach to enhancing film deposition processes.
Latest Patents
One of his latest patents is the "Magnetron reactive bias sputtering method and apparatus." This invention significantly increases the film deposition rate of metallic compounds onto a substrate in a vacuum chamber. By utilizing a substrate support with spaced apart magnetic poles, a magnetic field is created that enhances the chemical reaction rate at the substrate, resulting in superior physical and chemical characteristics of the metallic compound coating.
Another notable patent is the "Focusing magnetron sputtering apparatus." This invention features a cathode assembly with parallel elongated target segments designed for efficient sputter-deposition onto a substrate. The inclined material removal surfaces of the target segments improve the efficiency of the sputtering operation and reduce machine downtime for cleaning and vacuum pumping.
Career Highlights
Michael L Hill is associated with Materials Research Corporation, where he applies his expertise in sputtering technology to advance the company's research and development efforts. His work has been instrumental in improving the efficiency and effectiveness of film deposition processes.
Collaborations
Throughout his career, Michael has collaborated with notable colleagues, including Walter H Class and Steven D Hurwitt. These collaborations have contributed to the advancement of innovative technologies in the field.
Conclusion
Michael L Hill's contributions to sputtering technology through his patents and collaborations highlight his role as a leading inventor in the industry. His innovative methods continue to influence the efficiency of film deposition processes, showcasing the importance of his work in materials research.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile