Location History:
- Evanston, IL (US) (2016 - 2017)
- Chicago, IL (US) (2016 - 2020)
Company Filing History:
Years Active: 2016-2020
Title: Michael L Geier: Innovator in Graphene Technology
Introduction
Michael L Geier is a prominent inventor based in Chicago, IL (US), known for his significant contributions to the field of graphene technology. With a total of 14 patents to his name, Geier has made remarkable advancements in the preparation of concentrated graphene ink compositions and related composite materials.
Latest Patents
Geier's latest patents include innovative methods for the preparation of concentrated graphene ink compositions. His work focuses on a rapid, scalable methodology for graphene dispersion and concentration using a polymer-organic solvent medium. This methodology can be utilized without centrifugation, enhancing graphene concentration effectively.
Career Highlights
Throughout his career, Geier has worked with esteemed institutions such as Northwestern University and Stryde Technologies, Inc. His research has paved the way for new applications of graphene in various industries, showcasing his expertise and dedication to innovation.
Collaborations
Geier has collaborated with notable colleagues, including Mark C Hersam and Pradyumna L Prabhumirashi, further enriching his research and contributions to the field.
Conclusion
Michael L Geier's work in graphene technology exemplifies the spirit of innovation and dedication to advancing materials science. His patents and collaborations continue to influence the development of new technologies in this exciting field.