Company Filing History:
Years Active: 2008-2009
Title: Michael Kountz: Innovator in Semiconductor Fabrication
Introduction
Michael Kountz is a notable inventor based in Gilbert, AZ (US). He has made significant contributions to the field of semiconductor fabrication, holding 2 patents that showcase his innovative approaches. His work primarily focuses on enhancing the performance and reliability of semiconductor materials.
Latest Patents
Kountz's latest patents include a method of fabricating semiconductors by nitrogen doping of silicon film. This method utilizes chemical vapor deposition or plasma-enhanced chemical vapor deposition to deposit an amorphous silicon film on a substrate, such as an ASIC wafer. The incorporation of nitrogen reduces the conductivity of the film and augments its breakdown voltage. Additionally, he has developed a low-temperature texturing layer to enhance the adhesion of subsequent layers. This method involves forming an adhesion layer that is chemically bonded to the substrate and features a textured surface, allowing for improved film formation.
Career Highlights
Michael Kountz is currently employed at Pan Jit Americas, Inc., where he continues to push the boundaries of semiconductor technology. His expertise in the field has made him a valuable asset to the company and the industry as a whole.
Collaborations
Throughout his career, Kountz has collaborated with talented individuals such as Randy Olsen and Michael Adamson. These partnerships have contributed to the advancement of his projects and innovations.
Conclusion
Michael Kountz's contributions to semiconductor fabrication demonstrate his commitment to innovation and excellence in technology. His patents reflect a deep understanding of material science and engineering, positioning him as a key figure in the industry.