Company Filing History:
Years Active: 2000
Title: Michael Kocsis: Innovator in Chemical-Mechanical Polishing
Introduction
Michael Kocsis is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of chemical-mechanical polishing (CMP), particularly in the area of erosion control features. His innovative approach addresses the challenges associated with nonuniform planarization in CMP processes.
Latest Patents
Kocsis holds a patent for "Sacrificial erosion control features for chemical-mechanical polishing." This invention provides a method and apparatus for compensating for the effects of nonuniform planarization, specifically targeting the erosion that occurs from the removal of titanium nitride and tungsten films. The patent describes a system where dummy marks are placed on both sides of actual alignment marks, ensuring that the actual marks remain in areas of uniform erosion during the CMP process.
Career Highlights
Michael Kocsis is currently employed at Intel Corporation, where he continues to develop innovative solutions in semiconductor manufacturing. His work has been instrumental in enhancing the efficiency and effectiveness of CMP techniques.
Collaborations
Kocsis has collaborated with esteemed colleagues, including Michael A. Maxim and Ning Hsieh, contributing to advancements in their shared field of expertise.
Conclusion
Michael Kocsis is a prominent figure in the realm of chemical-mechanical polishing, with a focus on improving erosion control methods. His contributions have the potential to significantly impact the semiconductor industry.