Michael Kaplan is a notable inventor based in Franklin Township, NJ (US). He has made significant contributions to the field of electron exposure technology, holding a total of 5 patents. His work has advanced the capabilities of microlithographic processes, which are essential in various applications, including semiconductor manufacturing.

Latest Patents

Among his latest patents, Kaplan has developed an "Electron flood exposure apparatus." This apparatus includes an electron gun that provides an electron beam, a dispersing means to convert the beam into an electron flood, a post-dispersion collimation and acceleration grid, and a target holder for microlithographic resist exposure. Another significant patent is the "Method of exposing and developing a homopolymer resist." This method utilizes homopolymers of 1-aza-5-acryloxymethyl-3,7-dioxabicyclo[3.3.0]octane, which are effective as resists for recording information patterns with high sensitivity and excellent contrast between exposed and unexposed areas.

Career Highlights

Michael Kaplan has had a distinguished career, primarily working with RCA Inc. His innovative approaches and technical expertise have positioned him as a key figure in the development of advanced electron exposure technologies. His patents reflect a deep understanding of the complexities involved in microlithography and resist materials.

Collaborations

Throughout his career, Kaplan has collaborated with notable colleagues, including Aaron W. Levine and Richard Joseph Himics. These collaborations have likely contributed to the success and impact of his inventions in the field.

Conclusion

Michael Kaplan's contributions to electron exposure technology through his patents and collaborations highlight his role as an influential inventor. His work continues to shape advancements in microlithography and related fields.

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