Michael John Matts

Title: Michael John Matts: Innovator in Microelectronics

Introduction

Michael John Matts is a notable inventor based in Poughkeepsie, NY. He has made significant contributions to the field of microelectronics, particularly through his innovative patent that enhances the manufacturing process of microelectronic substrates.

Latest Patents

Matts holds a patent for a "Reduced cavity depth screening stencil." This invention discloses an improved mask for screening a conductive paste onto a microelectronic substrate. The mask comprises a metal foil with a thickness of less than about 200 microns, featuring a stencil formed in the foil that extends inwardly to a first depth. This stencil includes a plurality of voids corresponding to the desired pattern. Additionally, the mask has a mesh formed in the foil that extends inwardly to a second depth from the opposite exterior surface. The mesh also comprises voids in communication with the stencil's voids. The ratio of the first depth to the second depth is less than 60:40, and the mask is produced from an essentially homogenous metal sheet. Such masks are particularly useful for fabricating microelectronic substrates with screened lines of conductive paste. Matts has 1 patent to his name.

Career Highlights

Michael John Matts is associated with the International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to be at the forefront of technological advancements in microelectronics.

Collaborations

Throughout his career, Matts has collaborated with notable colleagues, including James C Utter and Ahmed Sayeed Shah. These collaborations have contributed to the development of innovative solutions in the field.

Conclusion

Michael John Matts is a distinguished inventor whose work in microelectronics has led to significant advancements in manufacturing processes. His patent for the reduced cavity depth screening stencil exemplifies his innovative spirit and dedication to improving technology.