Company Filing History:
Years Active: 2005-2021
Title: Michael John Estes: Innovator in TDLAS Technology
Introduction
Michael John Estes is a prominent inventor based in Longmont, Colorado. He has made significant contributions to the field of tunable diode laser absorption spectroscopy (TDLAS), holding a total of 12 patents. His work focuses on developing methods and apparatuses that enhance the efficiency and reliability of TDLAS measurements in challenging environments.
Latest Patents
One of his latest patents is titled "Method and apparatus for monitoring port blockage for TDLAS measurements in harsh environments." This invention features a TDLAS optical head that includes a housing designed for attachment to a sight tube connected to a process chamber wall. The optical head is equipped with optics that facilitate the transmission and reception of a laser beam within the chamber through the sight tube. Additionally, it incorporates a photo sensor positioned to detect light emitted by combustion processes within the chamber.
Another notable patent by Estes is also focused on monitoring port blockage in TDLAS systems. This method involves using a photo sensor within the TDLAS optical head to receive light emitted by processes in the chamber. The system monitors the emission signal produced by this light and determines if the signal is degrading, which is crucial for maintaining accurate measurements.
Career Highlights
Throughout his career, Michael John Estes has worked with esteemed organizations such as the University of Colorado and Zolo Technologies, Inc. His experience in these institutions has allowed him to refine his expertise in laser technology and its applications in various industrial settings.
Collaborations
Estes has collaborated with notable professionals in his field, including Bernard Patrick Masterson and Andrew D Sappey. These partnerships have contributed to the advancement of TDLAS technology and its practical applications.
Conclusion
Michael John Estes is a distinguished inventor whose work in TDLAS technology has significantly impacted the field. His innovative patents and collaborations reflect his commitment to advancing measurement techniques in harsh environments. His contributions continue to influence the industry and inspire future innovations.