Michael J Roderick

Title: Michael J Roderick: Innovator in Plasma Light Source Technology

Introduction

Michael J Roderick is a notable inventor based in Everett, MA (US). He has made significant contributions to the field of plasma light sources, holding a total of 3 patents. His innovative work focuses on developing advanced technologies that enhance light generation through plasma confinement.

Latest Patents

Roderick's latest patents include the "Inductively Coupled Plasma Light Source" and the "Inductively Coupled Plasma Light Source with Switched Power Supply." The first patent describes a plasma chamber designed for a UV light source, featuring a plasma generation region that defines a plasma confinement area. This design includes a port that allows generated light to exit the chamber, along with a high voltage region coupled to the plasma generation area. The second patent outlines a method and apparatus for generating light, which involves a chamber with distinct high and low voltage regions. This design utilizes a magnetic core to generate plasma, creating a magnetically confined Z-pinch plasma that effectively propagates light.

Career Highlights

Throughout his career, Roderick has worked with several prominent companies, including Energetiq Technology, Inc. and Hamamatsu Photonics K.K. His experience in these organizations has contributed to his expertise in plasma technology and light generation.

Collaborations

Roderick has collaborated with notable individuals in his field, including Stephen F Horne and Frederick Marvin Niell, III. These partnerships have likely fostered innovation and advancements in the technologies he has developed.

Conclusion

Michael J Roderick stands out as an influential inventor in the realm of plasma light source technology. His patents and career achievements reflect his dedication to advancing this field, making significant contributions that enhance our understanding and application of plasma technology.