The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2024
Filed:
Feb. 21, 2022
Hamamatsu Photonics K.k., Shizuoka, JP;
Energetiq Technology, Inc., Wilmington, MA (US);
Stephen F. Horne, Medford, MA (US);
Kosuke Saito, Hamamatsu, JP;
Wolfram Neff, Woburn, MA (US);
Robert M. Grzybinski, Gloucester, MA (US);
Michael J. Roderick, Everett, MA (US);
Hamamatsu Photonics K.K., Shizuoka, JP;
Energetiq Technology, Inc, Wilmington, MA (US);
Abstract
A plasma chamber for a UV light source includes a plasma generation region that defines a plasma confinement region. A port is positioned adjacent to a side of the plasma generation region that allows generated light to pass out of the chamber. A high voltage region is coupled to the plasma generation region. A grounded region is coupled to the high voltage region that defines an outer surface configured to be coupled to the ground and is dimensioned for receiving a surrounding inductive core. A width of the high voltage region is greater than the width of the grounded region.