Michael Hsieh

Title: Michael Hsieh: Innovator in Gate Alignment Technologies

Introduction

Michael Hsieh is a notable inventor based in Saratoga Springs, NY (US). He has made significant contributions to the field of integrated circuit (IC) technology, particularly in the area of gate alignment marks. His innovative work has led to the development of methods that enhance the performance and reliability of semiconductor devices.

Latest Patents

Hsieh holds a patent for "Active pad patterns for gate alignment marks." This patent discloses methods for forming RX pads that have gate alignment marks designed to reduce noise between layers while minimizing non-uniformity in chemical mechanical polishing (CMP) processes for integrated circuits. The patent outlines several embodiments, including the provision of RX pads with specific horizontal and vertical positions, as well as the formation of gate alignment marks that are precisely aligned with the pads.

Career Highlights

Michael Hsieh is currently employed at Globalfoundries Singapore Pte. Ltd., where he continues to push the boundaries of semiconductor technology. His work at Globalfoundries has positioned him as a key player in the development of advanced manufacturing techniques for integrated circuits.

Collaborations

Hsieh has collaborated with several talented individuals in his field, including Ming Hao Tang and Frank Kahlenberg. These collaborations have fostered an environment of innovation and have contributed to the advancement of technologies in semiconductor manufacturing.

Conclusion

Michael Hsieh's contributions to the field of integrated circuits through his innovative patent work and collaborations highlight his importance as an inventor. His efforts continue to shape the future of semiconductor technology, making a lasting impact on the industry.