This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Infineon Technologies Ag. Active years: 2013-2016.
Company Filing History:
Years Active: 2013-2016
Title: Michael Hartenberger: Innovator in Etching Technology
Introduction
Michael Hartenberger is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of etching technology, particularly in methods that enhance the precision and efficiency of the etching process. With a total of 2 patents to his name, Hartenberger's work is recognized for its innovative approach to layer assembly etching.
Latest Patents
Hartenberger's latest patents include a device and method for stopping the etching process. This method involves etching a layer assembly that consists of an intermediate layer sandwiched between an etch layer and a stop layer. The process includes a step of etching the etch layer using a first etchant and a step of etching the intermediate layer using a second etchant. The first etchant has a selectivity of at least 5:1 with respect to both the etch layer and the intermediate layer. Similarly, the second etchant also has a selectivity of at least 5:1 concerning the intermediate layer and the stop layer. Notably, the first etchant is different from the second etchant, showcasing Hartenberger's innovative approach to etching technology.
Career Highlights
Michael Hartenberger is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in the industry.
Collaborations
Hartenberger has collaborated with notable colleagues, including Georg Seidemann and Lothar Brencher. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies in etching processes.
Conclusion
Michael Hartenberger stands out as an influential inventor in the field of etching technology. His innovative patents and contributions to Infineon Technologies AG highlight his commitment to advancing the industry. His work continues to pave the way for future developments in etching methods.