Location History:
- Stahndorf, DE (2004)
- Stahnsdorf, DE (2012)
Company Filing History:
Years Active: 2004-2012
Title: Michael Guggemos: Innovator in Metal Structure Manufacturing
Introduction
Michael Guggemos is a notable inventor based in Stahnsdorf, Germany. He has made significant contributions to the field of manufacturing pattern-forming metal structures. With a total of 2 patents to his name, Guggemos has developed innovative methods that enhance the performance of antennae and conductive patterns on dielectric substrates.
Latest Patents
Guggemos's latest patents include a method of manufacturing pattern-forming metal structures on a carrier substrate. This method aims to improve the transmission properties of antennae, particularly those used in the UHF range. The process involves several steps, including providing a carrier substrate, forming a pattern with a composite material containing dispersed metal, and depositing a metal layer onto the formed pattern.
Another significant patent is the method of forming a conductive pattern on dielectric substrates. This method entails coating a substrate with a protective layer, stripping away parts of this layer using UV radiation, and then etching the exposed metal film. This innovative approach allows for the reproducible manufacturing of extremely fine conductive patterns.
Career Highlights
Michael Guggemos is currently employed at Atotech Deutschland GmbH, where he continues to push the boundaries of innovation in metal structure manufacturing. His work has been instrumental in developing advanced techniques that are applicable in various technological fields.
Collaborations
Guggemos has collaborated with notable colleagues, including Franz Kohnle and Matthias Dammasch. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Michael Guggemos stands out as a prominent inventor in the field of metal structure manufacturing. His innovative patents and collaborative efforts contribute significantly to advancements in technology.