Round Rock, TX, United States of America

Michael G Harrison

This inventor holds 2 USPTO granted patents. Top assignee: Freescale Semiconductor,inc.. Active years: 2008-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Michael G Harrison. Retrieved from https://idiyas.com/inventor/michael-g-harrison-izefx0kt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2008-2011

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2 patents (USPTO):Explore Patents

Title: Michael G. Harrison: Innovator in Semiconductor Fabrication

Introduction

Michael G. Harrison is a notable inventor based in Round Rock, Texas, recognized for his contributions to semiconductor fabrication processes. With a total of two patents to his name, Harrison has made significant strides in the field of technology.

Latest Patents

Harrison's latest patents focus on a semiconductor fabrication process that includes silicide stringer removal processing. This innovative process involves forming a gate electrode over a gate dielectric, which is situated above a semiconductor substrate of a wafer. The process also includes a liner dielectric layer with vertical portions adjacent to the sidewalls of the gate electrode and horizontal portions overlying the upper surface of the semiconductor substrate. A spacer is formed adjacent to a vertical portion and overlying a horizontal portion of the liner dielectric layer. After the spacer is formed, exposed portions of the liner dielectric layer are removed to create a liner dielectric structure covered by the extension spacer. The extension spacer is then etched back to uncover the extremities of the liner dielectric structure. Prior to etching back the spacer, a metal may be sputtered deposited over the wafer in preparation for forming a silicide. Following the etch back, the wafer may be dipped in piranha solution and cleaned with an RF sputter of argon.

Career Highlights

Michael G. Harrison is currently employed at Freescale Semiconductor, Inc., where he continues to innovate in the semiconductor industry. His work has contributed to advancements in semiconductor technology, enhancing the efficiency and effectiveness of fabrication processes.

Collaborations

Harrison has collaborated with notable coworkers, including Dharmesh Jawarani and John R. Alvis, who have also contributed to the field of semiconductor technology.

Conclusion

Michael G. Harrison's work in semiconductor fabrication processes showcases his innovative spirit and dedication to advancing technology. His contributions are significant in shaping the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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