Ritzville, WA, United States of America

Michael F Jernegan

This inventor holds 1 USPTO granted patent. Top assignee: Advanced Silicon Materials LLC. Active years: 1994.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Michael F Jernegan: Innovator in Silicon Technology

Introduction

Michael F Jernegan is a notable inventor based in Ritzville, WA (US). He has made significant contributions to the field of silicon technology, particularly in the development of methods for producing high-quality polycrystalline silicon.

Latest Patents

Jernegan holds a patent for a "Graphite chuck having a hydrogen impervious outer coating layer." This invention focuses on a method for creating substantially carbon-free polycrystalline silicon. The process involves pyrolyzing a gaseous silicon compound on a heated starter filament mounted on a graphite chuck. The heated filament is maintained at a temperature that allows for the decomposition of the gaseous silicon compound, resulting in the formation of polycrystalline silicon and by-product hydrogen. The graphite chuck is designed with a hydrogen impervious outer coating layer to prevent the by-product hydrogen from reacting with the graphite, which could lead to the formation of methane and carbon deposits on the silicon.

Career Highlights

Michael F Jernegan has dedicated his career to advancing silicon technology. His innovative approach has led to the development of methods that enhance the purity and quality of polycrystalline silicon, which is essential for various applications in the semiconductor industry.

Collaborations

Jernegan collaborates with Lyle C Winterton, working together at Advanced Silicon Materials LLC. Their partnership focuses on pushing the boundaries of silicon technology and improving production methods.

Conclusion

Michael F Jernegan's contributions to silicon technology through his innovative patent demonstrate his commitment to advancing the field. His work continues to influence the production of high-quality materials essential for modern technology.

Profile summary based on public USPTO records.
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