Michael E Costabile

Title: Michael E Costabile: Innovator in Semiconductor Processing

Introduction

Michael E Costabile is a notable inventor based in San Antonio, TX (US). He has made significant contributions to the field of semiconductor processing, holding 2 patents that showcase his innovative approach to technology.

Latest Patents

His latest patents include a method of processing a semiconductor wafer and a plasma processing apparatus. The method involves an improved fluid distribution head for a plasma processing system characterized by a non-planar dispersion plate with multiple apertures. This design features a concave, spherical portion with a radius of curvature of at least four feet. The mechanism for flowing process gas through the apertures includes an enclosure that defines a chamber communicating with the dispersion plate, a gas inlet, and a source of process gas. This fluid distribution head is integral to a complete plasma processing system, which includes a wafer pedestal and an R.F. generator that forms plasma between the dispersion plate and the wafer. The method for processing a semiconductor wafer entails clamping the wafer to a pedestal, imposing curvature, and releasing process fluid over the wafer through the apertures in the non-planar dispersion plate.

Career Highlights

Michael E Costabile is currently employed at VLSI Technology, Inc., where he continues to develop innovative solutions in semiconductor technology. His work has significantly impacted the efficiency and effectiveness of plasma processing systems.

Collaborations

Throughout his career, he has collaborated with notable coworkers such as William P Marsh and Michael P Relue, contributing to advancements in their field.

Conclusion

Michael E Costabile's contributions to semiconductor processing through his patents and work at VLSI Technology, Inc. highlight his role as an influential inventor in the industry. His innovative methods and designs continue to shape the future of semiconductor technology.