Company Filing History:
Years Active: 2001-2005
Title: Innovations of Michael Douglas in Substrate Processing Technology
Introduction
Michael Douglas, an accomplished inventor based in Sunnyvale, California, has made significant contributions to the field of substrate processing technology. With two patents to his name, Douglas has demonstrated a keen innovation spirit that addresses critical issues in substrate processing.
Latest Patents
One of his latest inventions involves a substrate support system that features a barrier capable of detecting fluid leakage. This innovative substrate support is designed with a receiving surface to hold substrates during processing within a substrate processing chamber. The system incorporates a pedestal with a conduit for circulating heat transfer fluid. The unique barrier around the conduit includes a fluid detection material that can detect leaks by altering its optical or electrical properties.
His second patent focuses on antenna coil assemblies for substrate processing chambers. This invention specifies an antenna coil assembly that includes an antenna coil secured within a frame. The frame is designed with a series of spaced-apart tabs around its periphery, ensuring the coil is attached at tabbed locations. To enhance durability, notches are incorporated between adjacent tabs, allowing for thermal expansion and contraction, thereby minimizing stresses on both the frame and the coil connections.
Career Highlights
Michael Douglas is currently associated with Applied Materials, Inc., a leader in materials engineering solutions. His work focuses on innovative technologies that enhance efficiency and reliability in substrate processing, making a significant impact on the industry.
Collaborations
Throughout his career, Douglas has collaborated with several talented colleagues, including Michael P. Karazim and Tetsuya Ishikawa. These collaborations have likely fostered innovative ideas and advancements in their shared field of expertise.
Conclusion
In conclusion, Michael Douglas stands out as a notable inventor whose work in substrate processing technology has led to important advancements. His innovative patents reflect a commitment to improving industry standards and enhancing operational efficiency. As he continues to collaborate and innovate, his contributions will undoubtedly shape the future of substrate processing.