This inventor holds 1 USPTO granted patent, plus 1 CIPO patent. Top assignee: Applied Material, Inc.. Active years: 1996.
Company Filing History:
Years Active: 1996
Title: Michael Dill - Innovator in Plasma Sputtering Technology
Introduction
Michael Dill is a notable inventor based in San Jose, CA (US). He has made significant contributions to the field of plasma sputtering technology. His innovative approach has led to the development of a unique patent that enhances the efficiency of sputtering processes.
Latest Patents
Michael Dill holds a patent for a method and apparatus titled "Sputtering using a plasma-shaping magnet ring." This invention involves a sputtering apparatus that employs an auxiliary magnetic structure situated between the substrate holder and the target of a plasma sputtering chamber. The purpose of this structure is to control the lateral extent of the plasma. The auxiliary magnetic structure has a lower field strength in the plasma region compared to the principal magnets. It is strategically placed outside and around the circumference of the chamber's anode shield. The principal magnets maintain the plasma in a ring adjacent to the sputtering target. The auxiliary magnetic structure allows the plasma ring to expand or contract depending on its magnetic strength, polarity, and position relative to the target.
Career Highlights
Michael Dill is currently associated with Applied Materials, Inc., a leading company in the semiconductor and display technology sector. His work at Applied Materials has allowed him to focus on advancing sputtering technologies, which are crucial for various applications in electronics manufacturing.
Collaborations
Throughout his career, Michael has collaborated with several talented individuals, including Mark A. Mueller and Mark Latz. These collaborations have contributed to the development of innovative solutions in the field of plasma technology.
Conclusion
Michael Dill's contributions to plasma sputtering technology through his patent and work at Applied Materials, Inc. highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of sputtering processes.