Michael David Steiman

Title: Michael David Steiman: Innovator in CMP Technology

Introduction

Michael David Steiman is a notable inventor based in Milpitas, CA (US). He has made significant contributions to the field of chemical mechanical planarization (CMP) technology. With a total of 2 patents, his work focuses on improving the efficiency and accuracy of substrate handling in CMP apparatuses.

Latest Patents

One of his latest patents is titled "Low friction gimbaled substrate holder for CMP apparatus." This invention provides an assembly for holding a substrate in a CMP apparatus, featuring a holder frame with an inner wall and at least one rolling mechanism. The design allows for reduced friction during the planarization process, enhancing the overall performance of the CMP apparatus. Another significant patent is "Apparatus for accurate endpoint detection in supported polishing pads." This optical window structure includes a support layer with a reinforcement layer and a cushioning layer, aimed at improving the accuracy of endpoint detection during polishing operations.

Career Highlights

Michael Steiman is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His innovative work has positioned him as a key contributor to advancements in CMP technology.

Collaborations

Throughout his career, Michael has collaborated with talented individuals such as Eugene Yuexing Zhao and Kang Jia. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the field.

Conclusion

Michael David Steiman's contributions to CMP technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the semiconductor industry positively.