Company Filing History:
Years Active: 2011
Title: The Innovative Contributions of Michael D. McFarland
Introduction
Michael D. McFarland is a visionary inventor based in Oakland, California, recognized for his contributions to the field of plasma deposition technology. With a single patent to his name, he has made a significant impact through his innovative apparatus designed for coating cylindrical tubes with precision.
Latest Patents
The patent held by McFarland is for the "Coaxial Plasma Arc Vapor Deposition Apparatus and Method." This invention presents an advanced technique for applying variable thickness coatings on the interior surfaces of cylindrical tubes. The apparatus operates using a variable pressure gas and includes a coaxially positioned cathode within the cylinder. By applying a voltage source between the cathode and the tube, McFarland generates a radial plasma arc that facilitates helical deposition along the tube's axis. The unique capability of varying gas pressure allows for the composition of the deposition film to be tailored, showcasing a blend of engineering and innovative thinking.
Career Highlights
Michael D. McFarland is associated with Alameda Applied Sciences Corporation, where his expertise contributes to the development of cutting-edge technologies. His career is marked by a strong commitment to innovation and the advancement of surface engineering processes.
Collaborations
In his professional journey, McFarland has collaborated with esteemed colleagues such as Mahadevan Krishnan and Jason Wright. Together, they engage in groundbreaking research, pushing the boundaries of plasma technology and material science.
Conclusion
Through his work, Michael D. McFarland exemplifies the spirit of invention and innovation. His patent not only advances technological capabilities but also paves the way for future developments in the field of plasma deposition. As he continues to contribute to Alameda Applied Sciences Corporation, the impact of his work is sure to resonate within industry circles and influence future innovations.
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