New Haven, CT, United States of America

Michael Capozziello

This inventor holds 2 USPTO granted patents. Top assignee: Sargent Manufacturing Company. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Michael Capozziello. Retrieved from https://idiyas.com/inventor/michael-capozziello

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 34(Granted Patents)


Location History:

  • New Havenn, CT (US) (2019)
  • New Haven, CT (US) (2019)

Company Filing History:


Years Active: 2019

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2 patents (USPTO):Explore Patents

Title: Michael Capozziello: Innovator in Door Lock Technology

Introduction

Michael Capozziello, based in New Haven, Connecticut, is an inventive mind with a focus on improving security solutions. With two patents to his name, he has made a significant impact in the field of door lock technology.

Latest Patents

Capozziello's latest innovation is the door lock escutcheon, which enhances both the functionality and aesthetic appeal of traditional door locks. This invention showcases his commitment to developing effective and user-friendly security solutions.

Career Highlights

Michael Capozziello is currently associated with Sargent Manufacturing Company, a renowned name in the security industry. His work there reflects his dedication to advancing technology in locking mechanisms.

Collaborations

Collaboration is key in innovation, and Capozziello has worked alongside talented coworkers, including Rick Leites and Wai Pang Wong. Together, they contribute to a creative environment that fosters the growth of cutting-edge security products.

Conclusion

With his contributions to the field of door lock technology, Michael Capozziello exemplifies the spirit of innovation. His work not only addresses security concerns but also enhances the overall user experience in everyday life.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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