Munich, Germany

Michael Blümel

This inventor holds 1 USPTO granted patent. Top assignee: Tesa Ag. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Michael Blümel. Retrieved from https://idiyas.com/inventor/michael-blümel-984uyp0z

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Michael Blümel

Introduction

Michael Blümel is a notable inventor based in Munich, Germany. He has made significant contributions to the field of laser-printable films. His innovative approach has led to the development of a unique method that enhances the production of these films.

Latest Patents

Blümel holds a patent for a "Method for producing a laser-printable film." This method involves printing an engraving layer with a UV-curable coating onto a support film. Following this, an electron-beam curable coating is applied on top of the engraving layer. The final step involves curing the film through electron irradiation, resulting in a high-quality product.

Career Highlights

Michael Blümel is currently employed at Tesa AG, a company known for its expertise in adhesive solutions. His work at Tesa AG has allowed him to focus on innovative projects that push the boundaries of technology in film production.

Collaborations

Blümel collaborates with Arne Koops, a fellow innovator in the field. Their partnership exemplifies the importance of teamwork in driving technological advancements.

Conclusion

Michael Blümel's contributions to the field of laser-printable films demonstrate his innovative spirit and dedication to advancing technology. His patent and work at Tesa AG highlight the impact of his inventions on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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