Michael Baklanov

Title: Michael Baklanov: Innovator in Anisotropic Etching Technology

Introduction

Michael Baklanov is a notable inventor based in Leuven, Belgium. He has made significant contributions to the field of microelectronics, particularly in the area of plasma etching technologies. His innovative methods have the potential to enhance the manufacturing processes of electronic components.

Latest Patents

Baklanov holds a patent for a method titled "Anisotropic etching of organic-containing insulating layers." This patent describes a technique for anisotropic plasma etching of organic-containing insulating layers. The method involves creating openings in an insulating layer formed on a substrate without depositing etch residues. The gaseous mixtures used in this process include fluorine-containing gases, oxygen-containing gases, or HBr with additives. This innovative approach allows for the effective patterning of low-k dielectrics, which is crucial in modern electronics.

Career Highlights

Michael Baklanov is associated with the Interuniversitair Microelektronica Centrum (imec), a leading research institution in microelectronics. His work at imec focuses on advancing etching technologies that are essential for the fabrication of high-performance electronic devices. His expertise in this area has positioned him as a key figure in the field.

Collaborations

Throughout his career, Baklanov has collaborated with esteemed colleagues, including Karen Irma Maex and Ricardo Alves Donaton. These collaborations have fostered innovation and have contributed to the development of cutting-edge technologies in microelectronics.

Conclusion

Michael Baklanov's contributions to anisotropic etching technology exemplify the importance of innovation in the field of microelectronics. His patent and work at imec highlight his role as a leading inventor in this critical area of research.