Miao Yu

Title: Innovations by Miao Yu in Laser Technology

Introduction

Miao Yu is an accomplished inventor based in New York, NY (US). He has made significant contributions to the field of laser technology, particularly in the area of surface planarization of polycrystalline silicon films. His innovative methods have the potential to enhance the performance of various electronic devices.

Latest Patents

Miao Yu holds a patent for a method titled "Laser irradiation induced surface planarization of polycrystalline silicon films." This patent describes a process for planarizing excimer laser annealed (ELA) polycrystalline thin films through irradiation. The method involves providing an ELA thin film that has an oxide layer and a top surface characterized by a first surface roughness defined by a plurality of protrusions. The oxide is etched away to reveal the ELA thin film, which is then irradiated with a short-pulse duration excimer laser beam. This process results in an irradiated thin film with a second surface roughness that is significantly lower than the initial roughness.

Career Highlights

Miao Yu is affiliated with Columbia University, where he continues to engage in research and development in the field of laser technology. His work has garnered attention for its innovative approach to improving the quality of silicon films used in various applications.

Collaborations

Miao Yu has collaborated with James S Im, contributing to advancements in their shared field of expertise. Their partnership has fostered a productive environment for innovation and research.

Conclusion

Miao Yu's contributions to laser technology, particularly through his patented methods, highlight his role as a significant inventor in the field. His work at Columbia University and collaborations with peers like James S Im further emphasize the impact of his innovations on the industry.