Miao Gao

Title: Miao Gao: Innovator in Lithography Technology

Introduction

Miao Gao is a prominent inventor based in Zhejiang, China. He has made significant contributions to the field of lithography through his innovative patent. His work focuses on enhancing the performance and efficiency of printing technologies.

Latest Patents

Miao Gao holds a patent for an imageable coating layer, thermal negative-working lithography printing plate, and the associated platemaking method. This invention relates to a coating layer that includes various constituents in specific parts by weight: a radically polymerizable compound (20-60 parts), a radiation-absorbing compound (0.5-12 parts), a free radical initiator (1-25 parts), a binding agent (10-70 parts), and a development accelerator (0.5-15 parts). The platemaking method involves preparing a printing plate precursor, patternedly exposing it, and removing the unexposed area through a development process. This innovative approach allows for flexible development processes, either 'on-press' or 'off-press', resulting in a printing plate with excellent performance.

Career Highlights

Miao Gao is associated with Zhejiang Konita New Materials Co., Ltd., where he continues to develop and refine his inventions. His work has positioned him as a key figure in the advancement of lithography technologies.

Collaborations

Miao collaborates with notable colleagues, including Ting Tao and Nganhau Yung, who contribute to his projects and innovations.

Conclusion

Miao Gao's contributions to lithography technology through his innovative patent demonstrate his commitment to advancing printing methods. His work continues to influence the industry positively.