This inventor holds 1 USPTO granted patent. Top assignee: Pusan National University. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: **Innovations by Mi Yeon Cheon: Pioneering Thin Film Technology**
Introduction
Mi Yeon Cheon, based in Busan, South Korea, is an innovative inventor known for her contributions to thin film technology. With a recognized patent in RF sputtering apparatus, she has made significant strides in controlling atomic layers of thin films, which are crucial in various technological applications.
Latest Patents
Mi Yeon Cheon's patented invention is an RF sputtering apparatus designed to control the atomic layer of a thin film. This apparatus includes essential components such as a sputtering main body that features a substrate, a target facing the substrate, and a chamber for the sputtering process. The invention also incorporates a power supply unit connected to the target, capable of applying RF power, along with a roughing pump unit for creating a vacuum within the chamber. Furthermore, it includes a gas supply unit for providing reaction gas into the chamber, ensuring optimal conditions for thin film deposition. Notably, the power cable used in this invention is made from single crystal copper wire, a feature that enhances performance.
Career Highlights
Mi Yeon Cheon is affiliated with the Pusan National University Industry-University Cooperation Foundation, where she has been instrumental in advancing research and development in her field. Her work showcases not only her technical expertise but also her commitment to innovation in practical applications related to thin films.
Collaborations
Throughout her career, Mi Yeon Cheon has collaborated with talented colleagues, including Se Young Jeong and You Sil Lee. These partnerships highlight the collaborative spirit prevalent in research and innovation, underscoring the importance of teamwork in achieving significant breakthroughs in technology.
Conclusion
Mi Yeon Cheon's pioneering work in RF sputtering apparatus marks a notable contribution to the field of thin film technology. Her patent exemplifies innovation that can lead to advancements in various industries, reflecting her skill as an inventor and the potential impact of her work on future technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile