Company Filing History:
2 out of 132,083 
2 out of 5 Years Active: 2018-2020
Title: Mi-Hyun Park: Innovator in Semiconductor Technology
Introduction
Mi-Hyun Park is a notable inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of compositions for removing photoresist.
Latest Patents
Mi-Hyun Park holds two patents that focus on innovative methods for removing photoresist from semiconductor substrates. His latest patents include a composition for removing photoresist, which consists of an alkyl ammonium fluoride salt, an organic sulfonic acid, and a lactone-based solvent. The specific amounts of these components range from about 0.5 weight percent to about 10 weight percent for the alkyl ammonium fluoride salt, from about 1 weight percent to about 20 weight percent for the organic sulfonic acid, and from about 70 weight percent to about 98.5 weight percent for the lactone-based solvent. These inventions are crucial for enhancing the manufacturing processes of semiconductor devices.
Career Highlights
Throughout his career, Mi-Hyun Park has worked with prominent companies in the technology sector. He has been associated with Samsung Electronics Co., Ltd. and Dongwoo Fine-chem, where he has applied his expertise in semiconductor technology.
Collaborations
Mi-Hyun Park has collaborated with several professionals in his field, including Jung-Min Oh and Hyo-San Lee, who have contributed to his innovative projects.
Conclusion
Mi-Hyun Park's work in semiconductor technology, particularly in the area of photoresist removal, showcases his innovative spirit and dedication to advancing the industry. His contributions are vital for the ongoing development of semiconductor manufacturing processes.